Quantitative SIMS Analysis of Trace Metallic Impurities in High Purity Copper

Article ID

96BEN41001

Title

Quantitative SIMS Analysis of Trace Metallic Impurities in High Purity Copper

SIMSによる高純度銅中の微量金属不純物の定量分析

Author(s)

Hiroyuki T. Takeshita (Osaka National Research Institute)
Takuya Kagawa (Matsushita Electric Works)
Ryosuke O. Suzuki
Toshio Oishi (Kansai University)
Katsutoshi Ono

竹下博之 (大阪工業技術研究所)
香川卓也 (松下電工株式会社)
鈴木亮輔
大石敏雄 (関西大学)
小野勝敏

Publication/Publisher

J. Japan Inst. Metals, Vol. 60, No.3 (1996), pp. 290-294.

日本金属学会誌第60巻第3号 (1996), 290-294頁

Abstract

Quantitative analysis of trace amounts of dominant impurities in copper, Ag, Fe, Ni and Pb, were studied using secondary ion mass spectrometry (SIMS). Based on the survey of the secondary ions species, which disturbed the detection of atomic ions of impurities, the removal of these disturbance is proposed as the two methods; applying the high resolution of mass spectrometry, and calculating the isotopic abundance. The precision, detection limit and relative sensitivity factor were experimentally discussed to establish the reliable quantitative SIMS analysis at the local area of high purity copper.