Electrochim.
Acta, 48(5),483-488(2003)
(Abstract)
Triethanolamine
(TEOA) and cysteine (Cys) were examined for the effect of chelating reagents to
deposit CdS thin films by means of two different processes. Those are the successive
ionic layer adsorption and reaction (SILAR) method and the successive under
potential deposition (UPD) method, in which Cd and S are separately deposited
on a polycrystalline Au substrate from each solution. Evaluation by stripping
voltammetry showed that the amount of the deposited CdS was increased for 1, 3,
5, 7, and 10 layers of CdS prepared by these methods. It was found that, with
the SILAR method, the order of the ability to increase CdS deposition was
Cys>TEOA>None. On the other hand, with the successive UPD method, the
order was None>TEOA>Cys, showing a certain inhibition in the
electrochemical deposition process. It is concluded that CdS deposition by the
SILAR method becomes compatible to the successive UPD when a suitable chelating
reagent was added to the Cd solution.
業績一覧による研究紹介にもどる
野坂芳雄ホームページにもどる